Description
SSB245/10 Projection Lithography is specially designed for TFT process on substrates geometry up to 730mmx920mm to meet mass production of G4.5 fab and various needs from customer.
Main Features:
- Modular design, scalable and dynamic stepper platform
- High performance system delivering a resolution of 2um
- Exposure of 6-inch mask to ensure low cost of ownership
- Suitable for G4.5 fab with glass substrate size up to 730mmx920mm
- UNIX operation system with good reliability
- SEMI standard supporting process data synchronous between equipments and fab automation platform
Standard Certification:
Application:
- TFT-LCD & OLED Array lithography process
Specification:
- Resolution <2um
- Exposure Light Source i-line mercury lamp
- Substrate Dimension 730mm × 920mm